• OVERVIEW

    In a partnership with Asahi Kasei of Japan, AZ markets a photosensitive polyimide under the tradename PIMEL(TM), as well as the ancillary developers and rinses.

    PIMEL photosensitive polyimide finds application as a passivation layer and stress buffer for advanced packaging, including "flip chip"-type wafer bumping.

  • FEATURES & BENEFITS
    • Photosensitive material
      processes like a photoresist using typical litho cell tools
    • High heat and chemical resistance
      excellent electrical and mechanical properties
    • Highly stable
      widely processable margin
  • PRODUCT LIST

    TMAH Developable Positive Tone (i-line / ghi-line)

    Detail

    I-700 series Standard
    AM series High photo speed

    Solvent Developable Negative Tone (g-line / i-line / ghi-line)

    Detail

    I-8000 series Standard
    BL series Low temp. Curing, Cu compatibility
    BM / BG series High Modulus
    G-7000 Series G-line
  • RELATED PRODUCTS

    The solvent-developable negative tone PIMEL polyimide is processed using High Purity Solvents including:

    Polyimide Solvents

    Detail

    A-515 Developer cyclopentanone-based
    A-330 Developer cyclohexanone-based blend
    A-430 Developer clyclopentanone/cyclohexanone blend
    C-260 Rinse PGMEA-based
    C-265 Rinse PGME/PGMEA mixture

  • GOOD TO KNOW

    Advise on safety handling:

    Refer to the current Material Safety Data Sheet (MSDS) and product label for detailed information prior to handling.

    More informaion is available on the Asahi Kasei website

CONTACT US

Let us know how we can help

Speak to Elaine Kokinda on

1-908-295-0324