Photoresist Strippers in Litho technology

OVERVIEW

Photoresist strippers are cleaners used to remove the photoresist and residual materials left over after the metal plating or etch processing are completed.

Strippers must be formulated to provide efficient removal of the photoresist and other residuals while preventing damage to the underlying substrate layer; and the strippers must also be formulated to work suitably in the stripping process to be used, either in an automatic tool or manual bath.
FEATURES & BENEFITS
- Proprietary formulations containing alkaline additives
  fast stripping speed with complete photoresist removal
- Aqueous-based formulations
  completely water-rinsable, suitable for automated wet-rinsing tools

Product	Detail
AZ® 400T	proprietary blend of NMP, glycol solvents, and special alkaline additives that strip resist fast, getter metal ion contamination, remove post etch sidewall polymers, and leave a clean surface free of trace organic residues; optimized for highest bulk resist removal rate.
AZ® 300T	proprietary blend of NMP, glycol solvents, and special alkaline additives that strip resist fast, getter metal ion contamination, remove post etch sidewall polymers, and leave a clean surface free of trace organic residues; more aggressive on post metal etch sidewall polymers.
AZ® Remover 100	high performance stripper for cleaner substrate surfaces and exceptional removal of novolac resins and other organic contaminants. This remover has a neutral pH and will not damage metal substrates. Water-rinsable and biodegradable.

RELATED PRODUCTS

Photoresist Strippers are used in conjunction with the appropriate Photoresist designed for the targeted feature size and lithography exposure system.
INDUSTRIES
Photoresist Strippers are used universally by the IC industry to manufacture many types of devices, including:
- DRAM
- NAND flash memory
- Logic such as microprocessors
- MEMS such as recording heads for magnetic HDD storage
GOOD TO KNOW
Advise on safety handling:

Refer to the current Material Safety Data Sheet (MSDS) and product label for detailed information prior to handling.

Storage conditions
- Keep sealed in original container.
- Avoid freezing and direct sunlight.
- Product should be stored above 32°F (0°C). See label for details.
- Empty containers may contain harmful residue.
Shelf life

Typically 18 months; Specifications are subject to revision. Contact your AZ account manager for additional information.

Package types

AZ strippers are compatible with most commercially available wafer and photomask processing equipment. Recommended materials of construction include stainless steel, PTFE, polypropylene, and high density polyethylene. Packages include US GAL, 4-Liter, 10-Liter, and US 55GAL/200-Liter.

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