• OVERVIEW

    Photoresist developers are used in every lithography process to create on the wafer surface the patterned image projected onto the photoresist.  The developers are typically basic aqueous solutions, formulated either with an organic amine such as TMAH, or an inorganic salt such as potassium hydroxide.

    Developers are segmented by their chemical type (organic or inorganic), their normality (i.e. the strength of solution which determines the speed of development), and whether they contain surfactants.

  • FEATURES & BENEFITS
    • High purity materials filtered to 0.1 μm and produced with tightly controlled normality
      to ensure reproducibility in the most advanced processes.
    • Surfactant formulations available
      aids in surface wetting and provides superior production throughput for sub-0.5 μm technology.
  • PRODUCT LIST

    Organic Developers

    Detail
    AZ 300 MIF 0.261N / 2.38% TMAH standard formulation
    AZ 326 MIF 0.261N / 2.38% TMAH w/surfactant
    AZ 330 MIF
    AZ 405 MIF
    AZ 726 MIF 0.261N / 2.38% TMAH w/surfactant
    AZ 833 MIF

    Typical specifications; Specifications are subject to revision. Contact your AZ Account Manager for additional information.

    Inorganic Developers

    Detail
    AZ® Developer 0.460 ± 0.010 (R1) 0.600 ± 0.005 (R2)
    AZ® Developer 1:1 0.230 ± 0.005 (R1) 0.3000 ± 0.0025(R2)
    AZ® 400K Developer 0.482 ± 0.005 (R1) 1.390 ± 0.005(R2)
    AZ® 400K Developer 1:3 = 0.120 ± 0.001 (R1) 0.348 ± 0.001(R2)
    AZ® 400K Developer 1:4 0.0960 ± 0.0005 (R1) 0.2780 ± 0.0005(R2)
    AZ® 421K Developer 0.210 ± 0.001 (R1)
  • RELATED PRODUCTS

    Photoresist Developers are used in conjunction with the appropriate Photoresist designed for the targeted feature size and lithography exposure system.

  • INDUSTRIES

    Photoresist Developers are used by the various industries to manufacture many types of devices, including:

    • Flat Panel Displays
    • OLED
    • Color filter
    • e-paper
    • touch panel
    • Flash memory
    • Discrete and power
    • DRAM
    • CCD image sensors
    • Microprocessors
    • Hard disc drives
    • LED
  • GOOD TO KNOW

    Advise on safety handling:

    Refer to the current Material Safety Data Sheet (MSDS) and product label for detailed information prior to handling.

    Note: Contaminating inorganic developer baths or lines with tetramethylammonium hydroxide (TMAH) based metal-ion-free developers, even at the parts-per-million level, seriously affects the photospeed of the inorganic developer process. Use caution when changing developing equipment from a metal-ion-free to an inorganic process.

    Developer bath life is dependent on the amount of carbon dioxide absorbed from the air and on the amount of dissolved photoresist. Replenish the developer periodically, perhaps once a shift or when developer activity is reduced.

    Storage conditions

    • Keep in sealed original containers
    • Protect from sunlight
    • Store in a cool, dry place. See label for details
    • Empty container may contain harmful residue

    Shelf life

    Typically 18 months; Specifications are subject to revision. Contact your AZ Account Manager for additional information.

    Package types

    AZ developers are compatible with most commercially available wafer and photomask processing equipment. Recommended materials of construction include stainless steel, PTFE, polypropylene, and high density polyethylene. Packages include US GAL, 4-Liter, 10-Liter, and US 55GAL/200-Liter.

CONTACT US

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Speak to Elaine Kokinda on

1-908-295-0324