23 June 2011
The Conference of Photopolymer Science and Technology (Japan) Honours Dr. Dammel at June Event.
Dr. Ralph R. Dammel, Chief Technology Officer at AZ Electronic Materials, today received the Photopolymer Science and Technology Award, “The Outstanding Achievement Award 2011,” at the ICPST-28 (The 28th International Conference of Photopolymer Science and Technology) hosted in Chiba, Japan. Dr. Dammel was recognised for his contributions to the development of new advanced photoresist materials for microelectronics applications.
Dr. Dammel has developed many types of photoresists during more than 25 years of work within the field, including i-line, DUV, 157nm, 193nm, 193nm immersion, e-beam, and X-ray materials. He has also led the development of several anti-reflective coating technologies, including the PFOS-free top antireflective coating which is used widely today by the semiconductor industry.
Geoff Wild, CEO of AZ Electronic Materials, remarked: “We are delighted that the Conference of Photopolymer Science and Technology has honoured Ralph’s contributions to the electronic materials field with this Award. It is a testament to the innovation that has been achieved in the materials sector in order to extend the IC roadmaps to ever finer geometries.”
Prof. Minoru Tsuda, Representative of The Conference of Photopolymer Science and Technology (CPST), remarked: “CPST is a world class international academic forum for engineers and scientists who research basic science and application of photopolymers. The Photopolymer Science and Technology Award (The Outstanding Achievement Award and the Best Paper Award of the Year) are established to praise the distinguished contributions of scientists who have made significant achievements in photopolymer science and technology. In this year we decided to recognise Dr. Ralph Dammel for his many years of contribution to photopolymer science”.
At the ICPST-28 conference, Dr. Dammel made the Award Lecture presentation entitled “Cost-Effective Sub-20nm Lithography: Smart Chemicals to the Rescue”, which described approaches that use “smart chemicals” and “bottom up” patterning processes employing molecular scale assembly processes such as directed self assembly (DSA) chemicals to meet advanced semiconductor node requirements.
Dr. Dammel was also recognised in 2009 when SPIE (www.spie.org; the Society of Photo-Optical Instrumentation Engineers) named him a Fellow.
Enquiries:
Majid Nazir
AZ Electronic Materials
+ 44 (0) 208 622 3825
majid.nazir@az-em.com
About The Conference of Photopolymer Science and Technology (CPST):
The CPST is world class international academic forum for engineers and scientists who research basic science and application of photopolymers. CPST held the 28th International Conference of Photopolymer Science and Technology (ICPST-28) at the Chiba University on July 21-24, 2011. The CPST also publishes the Journal of Photopolymer Science and Technology (JPST), with 6 issues per year, totalling approximately 800 pages a year since Vol. 1 in 1988. The CPST is publishing Vol. 24 in 2011. Every year CPST grants The Photopolymer Science and Technology Award (The Outstanding Achievement Award and the Best Paper Award of the Year) to outstanding scientists as recognition of their contributions to photopolymer science and technology development. For details, please visit the home page (www.ao.u-tokai.ac.jp/photopolymer/p.htm).
The Conference of Photopolymer Science and Technology Media Contacts:
Prof. Kenichiro Nakamura, Editorial Office, J. Phopol. Sci. Technol.
Department of Optical and Imaging Science & Technology, Tokai University
Kitakaneme, Hiratsuka, Kanagawa 259-1292 Japan
Tel +81-463-50-2156
Fax +81-463-50-2408
nakamura@keyaki.cc.u-tokai.ac.jp